Hemi-spherical structure and method for fabricating the same

ABSTRACT

Hemi-spherical structure and method for fabricating the same. A device includes discrete pillar regions on a substrate, and a pattern layer on the discrete support structures and the substrate. The pattern layer has hemi-spherical film regions on the discrete support structures respectively, and planarized portions on the substrate between the hemi-spherical film regions. Each of the hemi-spherical film regions in a position corresponding to each of the support structures serves as a hemi-spherical structure.

TECHNICAL FIELD

The present invention relates to hemi-spherical structures, andparticularly to hemi-spherical structures for image device applicationsand micro-electro-mechanical-system technology and methods forfabricating the same.

BACKGROUND

Microlenses are widely used in various fields including an opticalinformation processing system, an optical communication, an opticalpickup, an optical measurement, or solid-sate image devices. Solid-stateimage devices typically include a photosensor such as a photodiodeformed in or on a substrate, a color filter formed over thephotosensitive device and a microlens array formed over the colorfilter. The photosensor may be a photodiode, a CMOS (complimentary metaloxide semiconductor) sensor or a charge-coupled device (CCD), forexample. The function of the microlens is to efficiently collectincident light falling within the acceptance cone and refract this lightin an image formation process onto a focal plane at a depth defined bythe planar array of photodiode elements. In particular, development ofmore precise and small-sized microlenses is recently accelerated owingto miniaturization, integration and high performance requirements tooptical instruments.

One conventional method for manufacturing the microlens uses a thermalprocess and a blanket etch-back process to form a dielectric layer as amicrolens array on a substrate, but has difficulties in controllinguniformity, profile and curvature of the microlenses. FIGS. 1A to 1Dshow conventional ladder etching process sequences for forming amicrolens array. In FIG. 1A, a substrate 10 includes a silicon nitridelayer 12 on which discrete sections of photoresist pattern are formedthrough the use of photolithography. The photoresist pattern is thenthermally reflowed to produce rounded discrete photoresist sections 14.The ladder etching process sequence is then carried out to produceladder structures 12 a as shown in FIG. 1B. After an ashing process forremoving the remainder of the photoresist, a chemical downstream etching(CDE) process is employed to smooth the surface of the ladder structures12 a till curved microlenses 12 b are created on the substrate 10 asshown in FIG. 1C. This ladder etching process sequences, however, onlyprovides a lens height of 2˜6K Angstroms, causing a problem ofinsufficient curvature. If the amount of photoresist pull back and theladder height are altered for controlling thickness and slope of themicrolens to reach a lens height of more than 6K Angstroms, an undesiredUFO-shaped microlens 12 c will occur as depicted in FIG. 1D. Also, theremainder of the photoresist on the ladder profile is not uniform, andthereby the conventional microlens structure usually accompanies aroughness issue. In addition, a unique tool is requested for the CDEprocess, which needs long process time and has low throughput, causingproblems in the mass production.

Accordingly, a novel method is needed for the image device fabricationto produce a microlens array with desired curvature, height and profileby using a simple etching process.

SUMMARY OF THE INVENTION

Embodiments of the present invention include hemi-spherical structuresand methods of fabricating the same, which use a support structure tocontrol curvature, height and profile of the hemi-spherical structures.

In one aspect, the present invention provides a method of fabricatinghemi-spherical structures as follows. A first layer is formed on asubstrate, and then patterned as a plurality of support structures. Thesupport structure is a pillar region or a ladder-shaped region. A secondlayer is formed on the support structures. By performing an etchprocess, the second layer is shaped into a plurality of hemi-sphericalfilm regions over the support structures respectively. Each of thehemi-spherical film regions in a position corresponding to each of thesupport structures serves as a hemi-spherical structure.

In another aspect, the present invention provides a device having aplurality of pillar regions on a substrate, and a pattern layer on thepillar regions and the substrate. The pattern layer has a plurality ofhemi-spherical film regions on the pillar regions respectively. Each ofthe hemi-spherical film regions in a position corresponding to each ofthe pillar regions serves as a hemi-spherical structure.

In another aspect, the present invention provides a device having aplurality of ladder-shaped regions on a substrate, and a pattern layeron the ladder-shaped regions and the substrate. The pattern layer has aplurality of hemi-spherical film regions on the ladder-shaped regionsrespectively. Each of the hemi-spherical film regions in a positioncorresponding to each of the ladder-shaped regions serves as ahemi-spherical structure.

BRIEF DESCRIPTION OF THE DRAWINGS

The aforementioned objects, features and advantages of this inventionwill become apparent by referring to the following detailed descriptionof the preferred embodiments with reference to the accompanyingdrawings, wherein:

FIGS. 1A to 1D are cross-sectional diagrams illustrating conventionalladder etching process sequences for forming a microlens array;

FIGS. 2A to 2D are cross-sectional diagrams illustrating an exemplaryembodiment of a method of forming hemi-spherical structures; and

FIGS. 3A to 3D are cross-sectional diagrams illustrating anotherexemplary embodiment of a method of forming hemi-spherical structures.

DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

Embodiments of the present invention provide methods for fabricatinghemi-spherical structures for use in optical information processingsystem, optical communication, optical pickup, optical measurement, andsolid-sate image device applications. The hemi-spherical structurefabrication also adopts the Micro Electro-Mechanical System (MEMS)technology based upon the semiconductor processing to realize precisionmachining and more advantageous aspects in mass production. Theinventive method can well control curvature, height and profile of thehemi-spherical structures to overcome the aforementioned problems of theconventional method through the use of a ladder etching process and aCDE process. Particularly, the present invention provides ahemi-spherical structure formed of inorganic or organic materials, whichemploys a support structure (e.g., a pillar region or a ladder-shapedregion) under a hemi-spherical film region to control the height andcurvature of the hemi-spherical structure. Also, during an etch-backprocess for curving and smoothing the hemi-spherical film region, aplanarized region is created between two adjacent hemi-spherical filmregions. For microlens applications, the hemi-spherical structure mayemploy the same material for forming the support structure and thehemi-spherical film region. For MEMS applications, the hemi-sphericalstructure may employ the same material or different materials forforming the support structure and the hemi-spherical film region.

Reference will now be made in detail to the present embodiments,examples of which are illustrated in the accompanying drawings. Whereverpossible, the same reference numbers are used in the drawings and thedescription to refer to the same or like parts. In the drawings, theshape and thickness of one embodiment may be exaggerated for clarity andconvenience. This description will be directed in particular to elementsforming part of, or cooperating more directly with, apparatus inaccordance with the present invention. It is to be understood thatelements not specifically shown or described may take various forms wellknown to those skilled in the art. Further, when a layer is referred toas being on another layer or “on” a substrate, it may be directly on theother layer or on the substrate, or intervening layers may also bepresent.

Herein, cross-sectional diagrams of FIGS. 2A to 2D illustrate anexemplary embodiment of a method of forming hemi-spherical structures.In FIG. 2A, a substrate 20 is provided with a first layer 22 depositedthereon, for example deposited on a planarized surface of the substrate20. For image device fabrication, the substrate 20 is a siliconsubstrate, on which field oxide regions, photodiodes, inter-metaldielectric layers, metal wires, passivation layers, planarizationlayers, and color filters are fabricated and omitted in the Figures. Thefirst layer 22 may be an inorganic material or an organic material. Thefirst layer 22 may have a thickness, but is not limited to, about300˜10000000 Angstroms. The thickness of the first layer 22 is chosenspecifically for the scaling requirements of the hemi-sphericalstructures and may vary depending on future-developed processes. In oneembodiment, the first layer 22 is a silicon nitride layer, for example,formed through any of a variety of deposition techniques, includingLPCVD (low-pressure chemical vapor deposition), APCVD(atmospheric-pressure chemical vapor deposition), PECVD (plasma-enhancedchemical vapor deposition), PVD (physical vapor deposition), sputtering,and future-developed deposition procedures. It is to be appreciatedother well-known inorganic dielectric material such as silicon oxide,oxide-based dielectrics, nitride-based dielectrics and combinationsthereof for forming the first layer 22. In one embodiment, the firstlayer 22 may be a photoresist layer, for example, formed throughspin-coating or other advanced coating/depositing technology. It is tobe appreciated other well-known organic dielectric material such asthermoplastic materials or other photoresist-type materials performingdifferent refractivity.

Next, a plurality of discrete masking patterns 24 is provided on thefirst layer 22. For example, the masking patterns 24 are formed ofphotoresist defined by a photolithography process including photoresistcoating, soft baking, mask aligning, exposing, post-exposure baking,developing photoresist and hard baking. Each of the discrete maskingpatterns 24 may be a cylinder-like pattern, a square pillar, arectangular pillar or the like.

In FIG. 2B, using dry etch operation with the discrete masking patterns24 as an etch mask, the first layer 22 is shaped into discrete pillarregions 22 a. The masking patterns 24 are then removed. Each of thepillar regions 22 a serves as one part of a hemi-spherical structure,and is used as a support structure 22 a on which a hemi-spherical filmwill be formed in subsequent processes. By controlling the thickness andsize of the pillar region 22 a, the height of the hemi-sphericalstructure can be well adjusted to achieve desired high curvature. Forexample, the pillar region 22 a may be patterned as a cylinder, a squarepillar, a rectangular pillar or the like.

In FIG. 2C, a second layer 26 is deposited on the pillar regions 22 aand the exposed portions of the substrate 20, thus covering the spacebetween discrete pillar regions 22 a and having a deposited profilesubstantially consistent with the topography of the exposed surfaces.The second layer 26 selected from inorganic materials or organicmaterials may be formed of the same material as the first layer 22 formicrolens applications. Alternatively, for MEMS technology, the secondlayer 26 and the first layer 22 may be formed of different materials orthe same material. The second layer 26 may have a thickness, but is notlimited to, about 300˜10000000 Angstroms. The thickness of the secondlayer 26 is chosen specifically for the scaling requirements of thehemi-spherical structures and may vary depending on future-developedprocesses. In one embodiment, the second layer 26 is a silicon nitridelayer, for example, formed through any of a variety of depositiontechniques, including LPCVD (low-pressure chemical vapor deposition),APCVD (atmospheric-pressure-chemical vapor deposition), PECVD(plasma-enhanced chemical vapor deposition), PVD (physical vapordeposition), sputtering, and future-developed deposition procedures. Itis to be appreciated other well-known inorganic dielectric material suchas silicon oxide, oxide-based dielectrics, nitride-based dielectrics andcombinations thereof for forming the second layer 26. In one embodiment,the second layer 26 may be a photoresist layer, for example, formedthrough spin-coating or other advanced coating/depositing technology. Itis to be appreciated other well-known organic material such asthermoplastic materials or other photoresist-type materials performingdifferent refractivity.

In FIG. 2D, an etch-back process is performed to pattern the secondlayer 26 as hemi-spherical film regions 26 a over the pillar regions 22a respectively, without exposing the pillar regions 22 a and thesubstrate 20. The etch-back process employs an dry etch process, such asRIE (Reactive Ion Etching) or other plasma etching processes, forexample using F-based gas as an etchant for the silicon nitride option,to shape the second layer 26 in an anisotropically etching manner.Alternatively, the etch-back process may employs a wet etch process toshape the second layer 26. Particularly, some regions of the secondlayer 26 adjacent to the sidewalls of the pillar regions 22 a are shapedto create curved and smooth surfaces overhanging the pillar regions 22 arespectively, and another regions of the second layer 26 overlying theexposed portions of the substrate 20 is planarized. Thus, the secondlayer 26 disposed in a position corresponding to the pillar region 22 ais finally shaped into a hemi-spherical film region 26 a with a curvedand smooth surface, serving as a curved layer that functions as anotherpart of a hemi-spherical structure 28. By controlling the thickness ofthe second layer 26, the height of the hemi-spherical structure 28 canbe further adjusted to achieve desired high curvature. Also, during thisetch-back process, the hemi-spherical film regions 26 a are notcompletely separated, and a planarized region 26 b of the remainder ofthe second layer 26 is obtained in the space between two adjacenthemi-spherical film regions 26 a for maintaining the hemi-sphericalstructures 28 with an intended size and preventing functional defectsoccurred in the hemi-spherical structures 28.

In one embodiment, when the first layer 22 is formed of an organicmaterial, such as photoresist, the step of providing discrete maskingpatterns 24 as shown in FIG. 2A can be omitted. For example, the firstlayer 22 provided on the substrate 20 can be directly patterned asdiscrete pillar regions 22 a by a photolithography process includingphotoresist coating, soft baking, mask aligning, exposing, post-exposurebaking, developing photoresist and hard baking. This can simplify thehemi-spherical fabrication procedure and save process costs.

Accordingly, the hemi-spherical structures 28 are completed by usingsimple patterning and etch-back processes for forming the pillar regions22 a and the hemi-spherical film regions 26 a. Compared with theconventional ladder etch process and CDE process, the inventive methodhas higher throughput and is more easily implemented in the massproduction. Also, by controlling the height of the pillar region 22 aand/or the thickness of the second layer 26, the inventivehemi-spherical structure 28 can achieve a desired height more than 6KAngstroms, resulting in a desired high curvature.

In addition to the pillar regions 22 a as shown in FIG. 2B, anotherexemplary embodiment of the present invention employs a ladder-shapedregion as the support structure under the hemi-spherical film region 26a. Cross-sectional diagrams of FIGS. 3A to 3D illustrate anotherexemplary embodiment of a method of forming hemi-spherical structures.Explanation of the same or similar portions to the description in FIGS.2A-2D is omitted herein. In FIG. 3A, a substrate 20 is provided with afirst layer 22 and a plurality of discrete masking patterns 24. Each ofthe discrete masking patterns 24 may be a cylinder-like pattern, asquare pillar, a rectangular pillar or the like. In FIG. 3B, a ladderetching process sequence is then carried out and may include asuccession of alternating etching steps used to alternately laterallyremove the edges of the discrete masking patterns 24 and anisotropicallyetch the first layer 22 downward. The alternating etching steps mayinclude a downward (anisotropic) etching step and a photoresist pullback step together, which may be considered a unit process for formingone ladder, thus producing discrete ladder-shaped regions 22 b. Each ofthe ladder-shaped region 22 b is a stack structure composed of twoladder-shaped plates or more, in which the lower ladder-shaped plate islarger and thicker than the upper ladder-shaped plates. The maskingpatterns 24 are then removed. Each of the ladder-shaped regions 22 bserves as one part of a hemi-spherical structure, and is used as asupport structure 22 b on which a hemispherical film will be formed insubsequent processes. By controlling the thickness and size of theladder-shaped plates in the ladder-shaped region 22 b, the height of thehemi-spherical structure can be well adjusted to achieve desired highcurvature.

In FIG. 3C, a second layer 26 is deposited on the ladder-shaped regions22 b and the exposed portions of the substrate 20, thus covering thespace between discrete ladder-shaped regions 22 b and having a depositedprofile substantially consistent with the topography of the exposedsurfaces. In FIG. 3D, an etch-back process is performed to pattern thesecond layer 26 as hemi-spherical film regions 26 a over theladder-shaped regions 22 b respectively, without exposing theladder-shaped regions 22 b and the substrate 20. Particularly, someregions of the second layer 26 adjacent to the ladder profile of theladder-shaped regions 22 b are shaped to create curved and smoothsurfaces overhanging the ladder-shaped regions 22 b respectively, andanother regions of the second layer 26 overlying the exposed portions ofthe substrate 20 is planarized. Thus, the second layer 26 disposed in aposition corresponding to the ladder-shaped regions 22 b is finallyshaped into a hemi-spherical film region 26 a with a curved and smoothsurface, serving as a curved layer that functions as another part of ahemi-spherical structure 28. Also, during this etch-back process, thehemi-spherical film regions 26 a are not completely separated, and aplanarized region 26 b of the remainder of the second layer 26 isobtained in the space between two adjacent ladder-shaped regions 22 bfor maintaining the hemi-spherical structures 28 with an intended sizeand preventing functional defects occurred in the hemi-sphericalstructures 28.

Although the present invention has been described in its preferredembodiments, it is not intended to limit the invention to the preciseembodiments disclosed herein. Those skilled in this technology can stillmake various alterations and modifications without departing from thescope and spirit of this invention. Therefore, the scope of the presentinvention shall be defined and protected by the following claims andtheir equivalents.

1. A method of fabricating hemi-spherical structures, comprising:forming a first layer on a substrate; patterning said first layer as aplurality of support structures; forming a second layer on said supportstructures; and performing an etch-back process to shape said secondlayer into a plurality of hemi-spherical film regions over said Supportstructures respectively; wherein, each of said hemi-spherical filmregions in a position corresponding to each of said support structuresserves as a hemi-spherical structure.
 2. The method of claim 1, whereineach of said support structure is pillar region.
 3. The method of claim1, wherein each of said support structure is a ladder-shaped region. 4.The method of claim 1, wherein the step of patterning said first layercomprises exposing portions of said substrate between said supportstructures, and the step of forming said second layer comprises formingsaid second layer on said exposed portions of said substrate betweensaid support structures.
 5. The method of claim 4, wherein the step ofperforming an etch-back process comprises: forming said second layer onsaid exposed portions of said substrate as a plurality of planarizedregions between said hemi-spherical film regions.
 6. The method of claim1, wherein said second layer is formed of a material the same as saidfirst layer.
 7. The method of claim 1, wherein said second layer isformed of a material different from said first layer.
 8. The method ofclaim 1, wherein said first layer is a silicon nitride layer, a siliconoxide layer, or a photoresist layer.
 9. The method of claim 1, whereinsaid second layer is a silicon nitride layer, a silicon oxide layer, ora photoresist layer.
 10. The method of claim 1, wherein said first layeris formed of photoresist, and the step of patterning said first layer assaid support structures employs a photolithography process.
 11. Adevice, comprising: a plurality of pillar regions on a substrate; and apattern layer on said pillar regions and said substrate, wherein saidpattern layer comprises a plurality of hemi-spherical film regions onsaid pillar regions respectively; wherein, each of said hemi-sphericalfilm regions in a position corresponding to each of said pillar regionsserves as a hemi-spherical structure.
 12. The device of claim 11,wherein said pattern layer comprises a plurality of planarized regionson said substrate between said hemi-spherical film regions.
 13. Thedevice of claim 11, wherein said pillar region is formed of siliconnitride, silicon oxide, or photoresist.
 14. The device of claim 11,wherein said pattern layer is a silicon nitride layer, a silicon oxidelayer or a photoresist layer.
 15. The device of claim 11, wherein eachof said hemi-spherical film regions serves as a microlens structure ofan image device
 16. A device, comprising: a plurality of ladder-shapedregions on a substrate; and a pattern layer on said ladder-shapedregions and said substrate, wherein said pattern layer comprises aplurality of hemi-spherical film regions on said ladder-shaped regionsrespectively; wherein, each of said hemi-spherical film regions in aposition corresponding to each of said ladder-shaped regions serves asserves as a hemi-spherical structure.
 17. The device of claim 16,wherein said pattern layer comprises a plurality of planarized regionson said substrate between said hemi-spherical film regions.
 18. Theimage device of claim 16, wherein said ladder-shaped regions is formedof silicon nitride, silicon oxide, or photoresist.
 19. The device ofclaim 16, wherein said pattern layer is a silicon nitride layer, asilicon oxide layer or a photoresist layer.
 20. The device of claim 16,wherein each of said hemi-spherical film regions serves as a microlensstructure of an image device